As a software designer, I contributed to the research and development of ASML’s next-generation EUV lithography machine, the TWINSCAN EXE:5200. This highly advanced chip manufacturing system required complex software solutions to ensure precision, efficiency, and reliability.

My work involved C++ development, formal verification, and rigorous testing to meet the stringent requirements of semiconductor fabrication. I designed and implemented software for critical machine components, ensuring robust operation and seamless integration within the larger system. By leveraging formal verification techniques, I improved reliability and stability in high-precision environments. Through extensive testing and collaboration with multidisciplinary teams, I helped refine the software architecture to support ASML’s ongoing innovations in semiconductor technology.